简介:AnomalousLeakageCurrentinSilicon0xynitrideThinFilmsGrownbyMicrowaveExcitedNitrogenPlasmaNitridation.Applicationoftheexplosivemethodforcreatingnitrogenlayers;Brightplasmanitridingofferriticsteelwithseveralalloyingelements;Cleaningasthemostimportantsteptowardssuccessfulheattreatment
简介:[篇名]ActivatedMigrationSintering,[篇名]Activationofsteelsurfacesbyoxynitriding,[篇名]Activescreenplasmanitridingtechnology,[篇名]AdvancedPlasmaNitridingforAluminumandAluminumAlloys,[篇名]Ananti-corrosionandwear-resistingcompoundingnitridedlayeronprecisepressedpartsofsoftsteels,[篇名]Anexperimentalstudytocorrelatewaterjetimpingementerosionresistanceandpropertiesofmetallicmaterialsandcoatings,[篇名]AnInfluenceofSonBombardingontheEffectsofNitridinginD.C.GlowDischargePlasma。
简介:CharacteristicsofsiliconoxynitridesmadebyECRplasmas;CharacterizationandcomparisonofPECVDsiliconnitrideandsiliconoxynitridedielectricforMIMcapacitors;CharacterizationofsiliconoxynitridethinfilmsdepositedbyECR-PECVD;Characterizationofsiliconoxynitridesandhigh-kdielectricmaterialsbyangle-resolvedX-rayphotoelectronspectroscopy
简介:[篇名]3-inchfull-colorOLEDdisplayusingaplasticsubstrate,[篇名]AsignificantimprovementinmemoryretentionofMFISstructurefor1T-typeferroelectricmemorybyrapidthermalannealing,[篇名]Accuratereliabilityevaluationofnon-uniformultrathinoxynitridcandhigh-klayers,[篇名]Advancedgatedielectricmaterialsforsub-100nmCMOS,[篇名]AINfilmscpitaxialyformedbydirectnitridationofsapphireusingaluminumoxynitridcasabufferlayer,[篇名]Amorphoussilicon-oxynitridcsubmicronfibres,[篇名]CharacteristicsofCr-Al-N-Othinfilmspreparedbypulsedlaserdeposition.
简介:[篇名]Astudyonfrictionandwearbehaviourofcarburized,carbonitridedandboridedAISI1020and5115steels,[篇名]AlloyCarburizationatTemperaturesof1,200-2,100F(650-1,150℃),[篇名]Amorphoussiliconcarbonitridefibersdrawnfromalkoxidemodifiedceraser,[篇名]Bearingswithincrcasedreliability,[篇名]Brightoutlookforhardcoatings,[篇名]Carbonitridccoatingbylow-temperaturediffusionprocess,[篇名]Carbonitridcnanomaterials,thinfilms,andsolids.
简介:采用表面机械研磨处理(SMAT)技术实现了38CrMoAl钢的表面纳米化,并对表面纳米化后的样品进行了490℃离子氮碳共渗。采用扫描电镜、X-衍射、透射电镜、显微硬度仪等分析和测试手段,对处理后的样品进行观察分析及性能测试。结果表明:经SMAT处理的样品实现了低温离子氮碳共渗,渗层中渗入较多的氮、碳原子,并析出大量细小的高硬度化合物,获得了较好的硬度分布。