简介:CharacteristicsofsiliconoxynitridesmadebyECRplasmas;CharacterizationandcomparisonofPECVDsiliconnitrideandsiliconoxynitridedielectricforMIMcapacitors;CharacterizationofsiliconoxynitridethinfilmsdepositedbyECR-PECVD;Characterizationofsiliconoxynitridesandhigh-kdielectricmaterialsbyangle-resolvedX-rayphotoelectronspectroscopy
简介:[篇名]3-inchfull-colorOLEDdisplayusingaplasticsubstrate,[篇名]AsignificantimprovementinmemoryretentionofMFISstructurefor1T-typeferroelectricmemorybyrapidthermalannealing,[篇名]Accuratereliabilityevaluationofnon-uniformultrathinoxynitridcandhigh-klayers,[篇名]Advancedgatedielectricmaterialsforsub-100nmCMOS,[篇名]AINfilmscpitaxialyformedbydirectnitridationofsapphireusingaluminumoxynitridcasabufferlayer,[篇名]Amorphoussilicon-oxynitridcsubmicronfibres,[篇名]CharacteristicsofCr-Al-N-Othinfilmspreparedbypulsedlaserdeposition.
简介:[篇名]Astudyonfrictionandwearbehaviourofcarburized,carbonitridedandboridedAISI1020and5115steels,[篇名]AlloyCarburizationatTemperaturesof1,200-2,100F(650-1,150℃),[篇名]Amorphoussiliconcarbonitridefibersdrawnfromalkoxidemodifiedceraser,[篇名]Bearingswithincrcasedreliability,[篇名]Brightoutlookforhardcoatings,[篇名]Carbonitridccoatingbylow-temperaturediffusionprocess,[篇名]Carbonitridcnanomaterials,thinfilms,andsolids.
简介:[篇名]ChemicalbathdepositionofCdSthinfilmsforopticalandoptoclcctronicapplications,[篇名]Chloridehydrometallurgyforcomplexsulphides:areview,[篇名]CHLORIDEPROCESSINGOFMETALSULPHIDES:REVIEWOFFUNDAMENTALSANDAPPLICATIONS,[篇名]CopperinPoland,[篇名]Copperinsolidifiedcoppersmelterslags,[篇名]Copperlossesincoppersmeltingslags,[篇名]Corrosionbehaviorofalloy31-UNSNO8031-underconditionsofoil&gasproduction.
简介:CVDSYNTHESISANDCEMSSTUDYOFFeSULPHIDEANDOXIDETHINFILMS;DESIGNANDANALYSISOFWAVELENGTHSELECTIVEHOLOGRAPHICSOLARCONCENTRATORSFORITSUSEINDIFFERENTKINDOFSOLARCELLS;DistinguishingoretypesattheLacdesliesPGE-gold-copper-nickelmine,Ontario:implicationforresourcemodelling,miningandprocessing;Effectofrareearthsoncaststeelsulphideinclusions;
简介:摘要:表面处理技术是改善钢铁材料表面性能,提高表面硬度和耐磨性的重要手段,开发高效率、低能耗、环保的表面处理方法一直是人们努力的目标。液相感应渗入技术是一种新型表面化学热处理技术,本文采用液相感应渗入技术对中碳钢进行处理,构建了液相感应渗入试验装置,探讨了在三乙醇胺和甲酰胺溶液中进行碳氮共渗的可行性,研究了感应加热电流对碳氮共渗层的影响,确定了合适的工艺参数。
简介:采用表面机械研磨处理(SMAT)技术实现了38CrMoAl钢的表面纳米化,并对表面纳米化后的样品进行了490℃离子氮碳共渗。采用扫描电镜、X-衍射、透射电镜、显微硬度仪等分析和测试手段,对处理后的样品进行观察分析及性能测试。结果表明:经SMAT处理的样品实现了低温离子氮碳共渗,渗层中渗入较多的氮、碳原子,并析出大量细小的高硬度化合物,获得了较好的硬度分布。
简介:摘要目的旨在探讨联用抗抑郁药艾司西酞普兰米氮平治疗焦虑和抑郁障碍共病(CAD)的疗效及安全性。方法多次就医、符合病例纳入标准的69例患者随机分为三组合用组(A组)、米氮平组(B组)、艾司西酞普兰组(C组),每组23人,B组和C组各脱2例。分别给予相应的治疗,观察6周。治疗前及治疗第1、2、4、6周末予HAMD及HAMA评分观察治疗效果,并采用TESS量表及实验室指标评定不良反应。结果在治疗1周、2周、4周及6周末时,A组HAMD评分显著低于B组(P﹤0.05或P﹤0.01),在治疗4周、6周末A组HAMD显著低于C组(P﹤0.05)。在治疗1周和2周末时A组HAMA评分显著低于C组(P﹤0.05)。6周末三组总体疗效仍以A组疗效相对较好(0.05≤P<0.10),愈显率较高。三组TESS量表评分无显著性差异(P﹥0.05),A组不良反应相对较少。结论联用抗抑郁药艾司西酞普兰米氮平治疗焦虑和抑郁障碍共病,具有疗效好、起效快、不良反应小的特点。