简介:[篇名]ChemicalbathdepositionofCdSthinfilmsforopticalandoptoclcctronicapplications,[篇名]Chloridehydrometallurgyforcomplexsulphides:areview,[篇名]CHLORIDEPROCESSINGOFMETALSULPHIDES:REVIEWOFFUNDAMENTALSANDAPPLICATIONS,[篇名]CopperinPoland,[篇名]Copperinsolidifiedcoppersmelterslags,[篇名]Copperlossesincoppersmeltingslags,[篇名]Corrosionbehaviorofalloy31-UNSNO8031-underconditionsofoil&gasproduction.
简介:CVDSYNTHESISANDCEMSSTUDYOFFeSULPHIDEANDOXIDETHINFILMS;DESIGNANDANALYSISOFWAVELENGTHSELECTIVEHOLOGRAPHICSOLARCONCENTRATORSFORITSUSEINDIFFERENTKINDOFSOLARCELLS;DistinguishingoretypesattheLacdesliesPGE-gold-copper-nickelmine,Ontario:implicationforresourcemodelling,miningandprocessing;Effectofrareearthsoncaststeelsulphideinclusions;
简介:[篇名]Astudyonfrictionandwearbehaviourofcarburized,carbonitridedandboridedAISI1020and5115steels,[篇名]AlloyCarburizationatTemperaturesof1,200-2,100F(650-1,150℃),[篇名]Amorphoussiliconcarbonitridefibersdrawnfromalkoxidemodifiedceraser,[篇名]Bearingswithincrcasedreliability,[篇名]Brightoutlookforhardcoatings,[篇名]Carbonitridccoatingbylow-temperaturediffusionprocess,[篇名]Carbonitridcnanomaterials,thinfilms,andsolids.
简介:摘要现我司生产低速大扭矩液压马达中,有一部分元件均使用热处理工艺,特别是(灰铸铁油缸)配件而较为普遍的工艺为液体硫碳氮共渗——简称三元共渗处理;因原工艺的使用寿命及质量并不理想且性能不够稳定。为此,在参考原设计三元共渗工艺基础上,改进了部分工艺技术并在后续实验及实际使用证明了改进后的好效果,现对整套工艺技术流程作事下分析报告。
简介:CharacteristicsofsiliconoxynitridesmadebyECRplasmas;CharacterizationandcomparisonofPECVDsiliconnitrideandsiliconoxynitridedielectricforMIMcapacitors;CharacterizationofsiliconoxynitridethinfilmsdepositedbyECR-PECVD;Characterizationofsiliconoxynitridesandhigh-kdielectricmaterialsbyangle-resolvedX-rayphotoelectronspectroscopy
简介:[篇名]3-inchfull-colorOLEDdisplayusingaplasticsubstrate,[篇名]AsignificantimprovementinmemoryretentionofMFISstructurefor1T-typeferroelectricmemorybyrapidthermalannealing,[篇名]Accuratereliabilityevaluationofnon-uniformultrathinoxynitridcandhigh-klayers,[篇名]Advancedgatedielectricmaterialsforsub-100nmCMOS,[篇名]AINfilmscpitaxialyformedbydirectnitridationofsapphireusingaluminumoxynitridcasabufferlayer,[篇名]Amorphoussilicon-oxynitridcsubmicronfibres,[篇名]CharacteristicsofCr-Al-N-Othinfilmspreparedbypulsedlaserdeposition.